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About Us
Company Profile
Corporate Culture
Development History
Patent Certificate
Qualification and Honor
Products
Semiconductor Applications/UV Components
DI Lithography/ Maskless Lithography
Parallel Light/Proximity (Contact) Lithography
Projection/Step-and-Scan Lithography
Telematics Applications
Virtual Display/Myopia Prevention
Airborne Imaging Without Any Medium
Other Optics
Technology
News
Join Us
Talent Culture
Brilliant BHOE
Recruitment Positions
Contact Us
Message
Contact
中文
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DI Lithography/ Maskless Lithography
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0.4X-1.0X 405nm DI Lithography System
0.4X-1.0X 405nm DI Lithography System
0.4X-1.0X 405nm DI Lithography System
Fine-Line Photolithography
Fine-Line Photolithography
Specifications
Key Technical Indicators
Specifications
Magnification
0.4X-1.0X
waves
405nm
Line Width Resolution
4-10um
Application Fields
IC Substrate Trace Layer Photolithography Process with Automatic Focusing
Product Consultation
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